Title of article :
Thermal decomposition of Mo(CO)6 on thin Al2O3 film: A combinatorial investigation by XPS and UPS
Author/Authors :
Jiang، نويسنده , , Zhiquan and Huang، نويسنده , , Weixin and Zhang، نويسنده , , Zhen and Zhao، نويسنده , , Hong and Tan، نويسنده , , Dali and Bao، نويسنده , , Xinhe، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2007
Pages :
8
From page :
844
To page :
851
Abstract :
A thin and homogeneous alumina film was prepared by deposition and oxidation of aluminum on a refractory Re(0 0 0 1) substrate under ultrahigh vacuum conditions. X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS) and high-resolution electron-energy-loss spectroscopy (HREELS) demonstrate that the oxide film is long-range ordered, essentially stoichiometric and free from surface hydroxyl groups. The chemisorption and thermal decomposition of Mo(CO)6 on the Al2O3 film were investigated by means of XPS and UPS. Mo(CO)6 adsorbs molecularly on the oxide film at 100 K; however, thermal decomposition of the adsorbate occurs upon annealing at high temperatures. Consequently the metallic molybdenum clusters are deposited on the thin alumina film via complete decarbonylation of Mo(CO)6.
Keywords :
Molybdenum hexacarbonyl , Thin Al2O3 film , Thermal decomposition , X-ray photoelectron spectroscopy , Ultraviolet photoelectron spectroscopy
Journal title :
Surface Science
Serial Year :
2007
Journal title :
Surface Science
Record number :
1700256
Link To Document :
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