• Title of article

    Growth of thin alumina films on a vicinal NiAl surface

  • Author/Authors

    Ulrich، نويسنده , , Stefan and Nilius، نويسنده , , Niklas and Freund، نويسنده , , Hans-Joachim، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2007
  • Pages
    5
  • From page
    4603
  • To page
    4607
  • Abstract
    Dramatic changes in the surface morphology have been observed during the oxidation of stepped NiAl(16, 14, 1) by LEED and STM. The initial sequence of identical (1 1 0) terraces is lifted in favor of large, triangular planes, whose mean size is determined by the mismatch-induced stress that accumulates in the thin alumina film. The asymmetry of the original step direction on NiAl(16, 14, 1) with respect to the orientation of the two alumina reflection domains favors the formation of one domain type, for which the stress relief via NiAl step edges is particularly efficient.
  • Keywords
    Scanning tunneling microscopy , Aluminum oxide , Surface stress , Metal–insulator interface , Oxidation
  • Journal title
    Surface Science
  • Serial Year
    2007
  • Journal title
    Surface Science
  • Record number

    1702003