Title of article
Near-surface stresses in silicon(0 0 1)
Author/Authors
Delph، نويسنده , , T.J.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2008
Pages
9
From page
259
To page
267
Abstract
We report here on a detailed atomistic stress analysis of the near-surface stresses on the 2 × 1 surface reconstruction on Si(0 0 1). We find that the surface stresses are spatially periodic with fairly large amplitude. We additionally investigate the stresses in the neighborhood of an SA-type step.
Keywords
Construction and use of effective interatomic interactions , Semiempirical models and model calculations , computer simulations
Journal title
Surface Science
Serial Year
2008
Journal title
Surface Science
Record number
1702674
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