Title of article
Lithography on GaP(1 0 0) surfaces
Author/Authors
Flores-Perez، نويسنده , , Rosangelly and Zemlyanov، نويسنده , , Dmitry Y. and Ivanisevic، نويسنده , , Albena، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2008
Pages
6
From page
1993
To page
1998
Abstract
Two types of lithographic methods were used to modify GaP(1 0 0) surfaces with commercially available alkanethiol molecules: microcontact printing (μCP) and “dip-pen” nanolithography (DPN). The patterned surfaces were characterized by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS). The characterization was done in order to understand the quality of each type of pattern, its chemical composition, and the organization of the molecules on the surface. Differences between the two lithographic methods used to do lithography on the GaP(1 0 0) in this study were dependent on the chosen molecular “ink”.
Keywords
gallium phosphide , atomic force microscopy , infrared spectroscopy , Microcontact printing (?cp) , dip-pen Nanolithography (DPN) , X-ray photoelectron spectroscopy
Journal title
Surface Science
Serial Year
2008
Journal title
Surface Science
Record number
1703315
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