Title of article :
Stable surface termination on vicinal 6H–SiC(0 0 0 1) surfaces
Author/Authors :
Hayashi، نويسنده , , Kenjiro and Morita، نويسنده , , Kouhei and Mizuno، نويسنده , , Seigi and Tochihara، نويسنده , , Hiroshi and Tanaka، نويسنده , , Satoru، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2009
Pages :
5
From page :
566
To page :
570
Abstract :
Ordered nanofacet structures on vicinal 6H–SiC(0 0 0 1) surfaces, consisting of pairs of a (0 0 0 1) basal plane and a ( 1 1 2 ¯ n ) facet, are investigated in terms of stable surface stacking of the (0 0 0 1) basal planes. The surface termination of S3 (or S3*), i.e., ABC (or A*C*B*), was suggested by a structural model based on quantized step-bunching, which typically gives a one-unit-cell bunched step configuration at the ( 1 1 2 ¯ n ) facet. Here, we evaluate the surface termination at basal planes covered with a layer of silicon oxynitride by means of quantitative low-energy electron diffraction (LEED) analysis combined with scanning tunneling microscopy (STM), and show the validity of the structural model proposed.
Keywords :
Low energy electron diffraction , Step formation and bunching , silicon carbide
Journal title :
Surface Science
Serial Year :
2009
Journal title :
Surface Science
Record number :
1704344
Link To Document :
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