Title of article
Atomic structure of a regular Si(2 2 3) triple step staircase
Author/Authors
Chaika، نويسنده , , A.N. and Fokin، نويسنده , , D.A. and Bozhko، نويسنده , , S.I. and Ionov، نويسنده , , A.M. and Debontridder، نويسنده , , F. and Cren، نويسنده , , T. and Roditchev، نويسنده , , D.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2009
Pages
10
From page
752
To page
761
Abstract
An atomically accurate regular triple step array with a period of 4.8 nm has been fabricated on the vicinal Si(5 5 7) surface. Its atomic structure was studied on different length scales by scanning tunneling microscopy, low energy electron diffraction and photoelectron spectroscopy. These complementary methods allowed to identify the average orientation of the regular triple step staircase as Si(2 2 3) and to give a deeper insight into the atomic arrangement of this structure.
Keywords
Scanning tunneling microscopy , Low energy electron diffraction , Core level photoelectron spectroscopy , Triple step , Vicinal surface , Silicon
Journal title
Surface Science
Serial Year
2009
Journal title
Surface Science
Record number
1704425
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