Title of article :
Thermal decomposition of alkoxy monolayers grafted on silicon: A mechanistic model
Author/Authors :
Dusciac، نويسنده , , D. and Henry de Villeneuve، نويسنده , , C. and Allongue، نويسنده , , P. and Ozanam، نويسنده , , F. and Chazalviel، نويسنده , , J.-N.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2013
Abstract :
A recent spectroscopic study showed that alkoxy monolayers grafted on a (111) silicon surface thermally decompose in the 200–400 °C range by fragmentation of the alkyl chains [Surf. Sci. 601 (2007) 3961]. Here this behavior is reproduced by a numerical simulation, assuming that the elementary fragmentation steps have different probabilities, depending on the length of the fragments formed. The variation of the CH2/CH3 ratio, as determined experimentally by infrared spectroscopy, is reproduced with a set of fragmentation probabilities consistent with the enthalpy variation associated with each corresponding step.
Keywords :
grafting , Organic monolayers , Silicon , thermal stability
Journal title :
Surface Science
Journal title :
Surface Science