Title of article
A simple method to eliminate the surface defects of diamond particles
Author/Authors
Teng، نويسنده , , Feng and Bao، نويسنده , , Zhong and Zhang، نويسنده , , Peng and Zhang، نويسنده , , Guozhi and Gong، نويسنده , , Chengshi and Gao، نويسنده , , Caitian and Wang، نويسنده , , Jiangtao and Pan، نويسنده , , Xiaojun and Xie، نويسنده , , Erqing Xie، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2014
Pages
4
From page
299
To page
302
Abstract
Defects on diamond surface have a profound effect on certain properties of the diamond, enabling these properties to be tailored to the specific needs of important applications. A simple and practical method is described to repair the diamond particles with surface defects. The low grade diamond particles were repaired by hot-filament chemical vapor deposition with low carbon concentration in feed gases, and the defects on the surfaces disappeared because of the simple film formation and homoepitaxial growth mechanism during the CVD process. This efficient and simple method provides a way to extend its useful life during the actual application.
Keywords
Diamond particles , HFCVD , Crystal growth , Single crystal homoepitaxial
Journal title
Powder Technology
Serial Year
2014
Journal title
Powder Technology
Record number
1706266
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