Title of article
Atomic layer deposition of enantioselective thin film of alumina on chiral self-assembled-monolayer
Author/Authors
Moshe ، نويسنده , , Hagay and Levi، نويسنده , , Gila and Sharon، نويسنده , , Daniel and Mastai، نويسنده , , Yitzhak، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2014
Pages
6
From page
88
To page
93
Abstract
In this paper, we describe the synthesis of new chiral nanosized surfaces based on chiral self-assembled monolayers coated with metal oxide (Al2O3) nanolayers. In this new type of nanosized chiral surface, the Al2O3 nanolayers enable the protection of the chiral self-assembled monolayers while preserving their enantioselective nature. The chiral nature of the SAMs/Al2O3 films was characterized by a variety of techniques, such as, quartz crystal microbalance, circular dichroism (CD) spectroscopy and chiral crystallization. The proposed methodology for the preparation of nanoscale chiral surfaces described in this article could open up opportunities in other fields of chemistry, such as chiral catalysis.
Keywords
Chiral surfaces , Chiral self-assembled monolayers , Enantioselective crystallization , Al2O3
Journal title
Surface Science
Serial Year
2014
Journal title
Surface Science
Record number
1706527
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