Title of article :
Evaluation method of characteristics of Al2O3 coating materials
Author/Authors :
Roh، نويسنده , , Seung-Wan and Kang، نويسنده , , Sang-Woo and Kim، نويسنده , , Jin-Tae and Shin، نويسنده , , Jae-Soo and Moon، نويسنده , , Doo-Kyung and Son، نويسنده , , Tae-IL and Yun، نويسنده , , Ju-Young، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Abstract :
This paper has developed an evaluation method of the plasma-resistant characteristics of coated parts for plasma processing equipment. To quantitatively analyze the performance of coated parts, a plasma-resistant test was conducted on Al2O3 films, which have been widely used as a parts coating material. The breakdown voltage, surface roughness, etching rate, and particle generation were measured. The results indicated that the breakdown voltage dramatically decreased after plasma exposure, and electrical properties declined. Surface roughness, etching rate, and particle generation linearly increased depending on plasma exposure time. Under comprehensive consideration of the changes in characteristics caused by the impact of plasma processes, an evaluation method has been developed for the characteristics of coated parts for plasma processing equipment.
Keywords :
Al2O3 , Plasma-resistance , Anodizing , Semiconductor
Journal title :
Journal of Industrial and Engineering Chemistry
Journal title :
Journal of Industrial and Engineering Chemistry