Title of article :
The effect of pulsed electron beam pretreatment of magnetron sputtered ZrO2:Y2O3 films on the performance of IT-SOFC
Author/Authors :
Sochugov، نويسنده , , N.S. and Soloviev، نويسنده , , A.A. and Shipilova، نويسنده , , A.V. and Rabotkin، نويسنده , , S.V. and Rotshtein، نويسنده , , V.P. and Sigfusson، نويسنده , , I.T.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2013
Pages :
7
From page :
11
To page :
17
Abstract :
We describe a method of obtaining anode-supported ZrO2:Y2O3 (YSZ) electrolyte films produced by reactive magnetron sputtering for intermediate temperature solid oxide fuel cell applications. A pulsed electron beam treatment was used as a method of preliminary modification of the porous structure in anode substrates. We studied the influence of this pretreatment on the gas tightness, structural and electrochemical properties of deposited films. It is shown that magnetron sputtering combined with a pulsed electron-beam treatment leads to the formation of dense and uniform YSZ films of 3–5 μm in thickness with a fine microstructure and improvement of electrochemical properties. Multifold increase in power density and a decrease in the YSZ electrolyte resistance compared to the samples produced only by magnetron sputtering were achieved. Single cells with sputtered YSZ electrolyte and LSM as active cathode materials were tested. 1.08 V open circuit voltage and a 310 mW cm− 2 maximum power density were achieved at 700 °C by using humidified H2 as fuel and air as an oxidant.
Keywords :
Thin films , YSZ electrolyte , Scanning electron microscopy , Surface modification , Pulsed electron-beam treatment , Magnetron sputtering
Journal title :
Solid State Ionics
Serial Year :
2013
Journal title :
Solid State Ionics
Record number :
1712086
Link To Document :
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