Title of article :
Focused ion beam/lift-out transmission electron microscopy cross sections of block copolymer films ordered on silicon substrates
Author/Authors :
White، نويسنده , , H and Pu، نويسنده , , Y and Rafailovich، نويسنده , , M and Sokolov، نويسنده , , J and King، نويسنده , , A.H and Giannuzzi، نويسنده , , L.A and Urbanik-Shannon، نويسنده , , C and Kempshall، نويسنده , , B.W and Eisenberg، نويسنده , , A and Schwarz، نويسنده , , S.A and Strzhemechny، نويسنده , , Y.M، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2001
Pages :
7
From page :
1613
To page :
1619
Abstract :
Thin poly(styrene210-b-2-vinylpyridine200) and poly(2-vinylpyridine94-b-styrene760-b-2-vinylpyridine94) films spun cast on silicon and annealed at 180°C for 3 days were directly cross sectioned in less than 1 h using the focused ion beam (FIB) lift-out technique. We show that with the FIB procedure, it is possible to produce cross sections that reveal structure near the silicon interface and hence the surface induced phase transitions could be examined and compared quantitatively with theoretical models. Atomic force microscopy, dynamic secondary ion mass spectrometry, and transmission electron microscopy were used to characterize the films.
Keywords :
Focus ion beam/lift-out , Block copolymer , Transmission electron microscopy
Journal title :
Polymer
Serial Year :
2001
Journal title :
Polymer
Record number :
1713332
Link To Document :
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