Direct fabrication of oxide films by a microwave–hydrothermal method at low temperature

A new fabrication technique of oxide film (BaTiO3 film) has been investigated by the microwave–hydrothermal (M-H) method. The BaTiO3 films were directly fabricated on Ti substrates at low temperature (100 °C) and short holding time (below 1 h). The obtained phases were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The XRD patterns showed that a single phase of BaTiO3 film was formed on Ti plate. The formation process of BaTiO3 film was explained based on the photographs of SEM.