Title of article
Application of novel aerosol-assisted chemical vapor deposition techniques for SOFC thin films
Author/Authors
Meng، نويسنده , , Guangyao and Song، نويسنده , , Haizheng and Dong، نويسنده , , Zhi-Qiang and Peng، نويسنده , , Dingkun، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2004
Pages
6
From page
29
To page
34
Abstract
Novel aerosol-assisted chemical vapor deposition (AACVD) techniques have been developed at the authorʹs laboratory in the last decade, to prepare ceramic thin films mainly used as electrolyte and electrode materials for intermediate temperature and micro solid oxide fuel cell (SOFC). Four types AACVD including spray-aerosol-assisted metal-organic chemical vapor deposition (AAMOCVD), cold wall-AAMOCVD, microwave plasma-AACVD and combustion-AACVD have been designed and employed to prepare Y2O3-stabilized ZrO2, Y2O3-doped CeO2, Gd2O3-doped CeO2 and La0.8Sr0.2MnO3 thin films on various ceramic substrates. The metal β-diketonate chelates were chosen as the source materials for AAMOCVD. The structure, composition, morphology and electrical properties of these films were characterized. Thin film SOFC was also constructed and tested.
Keywords
Aerosol-assisted CVD , SOFCs , Thin films
Journal title
Solid State Ionics
Serial Year
2004
Journal title
Solid State Ionics
Record number
1716956
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