Preparation of amorphous lithium ion conductor thin films by pulsed laser deposition

Amorphous lithium ion conductor films were prepared by pulsed laser deposition (PLD). The morphology of the films was dependent on the preparation conditions, especially the optical absorbance of the target materials. A good amorphous thin film was obtained for the nominal composition of 0.6(Li4SiO4)–0.4(Li3VO4). The film was characterized through X-ray, FT-IR, Raman, a field emission scanning electron microscope (FE-SEM), an atomic force microscope (AFM) and an inducting coupled plasma (ICP). The ionic conductivity of the film was 10−7 S/cm at room temperature, which is one order smaller than the previously reported value of a partially crystallized RF-sputtered film.