Direct fabrication and patterning of Cu2O film by local electrodeposition method

We have developed a direct patterning method to form Cu2O patterns onto substrates by an electrodeposition method with a glass capillary tube, including an electrolyte containing CuSO4 and chelating agent. Cu2O pattern on the titanium substrates was successfully fabricated at 60 °C. Furthermore, we found that the chelating agent, which has −CH(OH)COOH group, was effective to form crystalline Cu2O patterns.