Title of article :
Breaking polymer chains by dynamic plowing lithography
Author/Authors :
Cappella، نويسنده , , B and Sturm، نويسنده , , H and Weidner، نويسنده , , S.M، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2002
Abstract :
The adhesion of poly(methyl methacrylate) (PMMA) and polystyrene (PS) films, whose surface has been previously structured by dynamic plowing lithography (DPL), has been measured by means of force–displacement curves. The different adhesion of modified and unmodified PS leads to the assumption that polymer chains are broken during DPL. After measuring the energy dissipated by the tip during DPL, in order to check that the transferred energy is sufficient to break covalent bonds, the polymer chain scission caused by the lithographic process has been definitely confirmed by size exclusion chromatography measurements of the lithographed films.
Keywords :
AFM , nanolithography , chain scission