Photosensitive poly(benzoxazole) based on precursor from diphenyl isophthalate and bis(o-aminophenol)

A new synthetic method for the preparation of poly(benzoxazole) (PBO) precursor, poly(o-hydroxyamide) (7) from bis(o-aminophenol) (5) and diphenyl isophthalate (6) has been developed. Polymer 7 was prepared by the polycondensation of 5 and 6 in 1-methyl-2-pyrrolidinone (NMP) at 185–205 °C. Model reactions were carried out in detail to elucidate appropriate conditions for the formation of 2-hydroxybenzanilide (3) from o-aminophenol (1) and phenyl benzoate (2). The photosensitive (PBO) precursor based on polymer 7 containing a 22% of benzoxazole unit and 30 wt% 1-{1,1-bis[4-(2-diazo-1-(2H)naphthalenone-5-sulfonyloxy)phenyl]ethyl}-4-{1-[4-(2-diazo-1(2H)naphthalenone-5-sulfonyloxy)phenyl]methylethyl}benzene (S-DNQ) showed a sensitivity of 110 mJ cm−2 and a contrast of 5.0 when it was exposed to 436 nm light followed by developing with a 2.38 wt% aqueous tetramethylammonium hydroxide solution at room temperature. A fine positive image featuring 8 μm line and space patterns was observed on the film of the photoresist exposed to 200 mJ cm−2 of UV-light at 436 nm by the contact mode.