Solvent vapor induced dewetting in diblock copolymer thin films

The dewetting pattern development of thin film of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer has been studied after ‘annealing’ in the PMMA block selective solvent vapor. Initially, typical circular dewetted holes are observed. Further annealing, however, results in the formation of fractal-like holes. The heterogeneous stress induced by the residual solvent remaining in the film after spin-coating induces the anisotropy of the polymer mobility during the annealing process, which triggers the formation of the intriguing surface patterns.