Title of article
Suspension polymerization stabilized by triblock copolymer with CdS nanoparticles
Author/Authors
Chen، نويسنده , , Kaiqiang and Yang، نويسنده , , Yongfang and Sa، نويسنده , , Qina and Shi، نويسنده , , Linqi and Zhao، نويسنده , , Hanying، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2008
Pages
6
From page
2650
To page
2655
Abstract
In this paper, a new method to prepare polymer colloid particles stabilized by triblock copolymer with CdS nanoparticles was described. Poly(ethylene glycol-block-styrene-block-2-(dimethylamino) ethyl methacrylate) (PEG-b-PS-b-PDMAEMA) triblock copolymer was synthesized by sequential ATRP method. Micelles with CdS nanoparticles in the corona were prepared by “in situ” reaction of hydrogen sulfide with cadmium ion clusters in the corona of the micelles. The size of the CdS nanoparticles is affected by molar ratio of DMAEMA to cadmium ions and polymer concentration in the solution. When introduced into o/w emulsion the micelles reassemble on the surface of styrene oil droplets. PS colloid particles stabilized by triblock copolymer with CdS nanoparticles were achieved by suspension polymerization. TEM image indicates that CdS nanoparticles locate at the surface of the PS colloid particles.
Keywords
Micelle , CdS nanoparticles , Suspension polymerization
Journal title
Polymer
Serial Year
2008
Journal title
Polymer
Record number
1731678
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