Title of article :
Suspension polymerization stabilized by triblock copolymer with CdS nanoparticles
Author/Authors :
Chen، نويسنده , , Kaiqiang and Yang، نويسنده , , Yongfang and Sa، نويسنده , , Qina and Shi، نويسنده , , Linqi and Zhao، نويسنده , , Hanying، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2008
Pages :
6
From page :
2650
To page :
2655
Abstract :
In this paper, a new method to prepare polymer colloid particles stabilized by triblock copolymer with CdS nanoparticles was described. Poly(ethylene glycol-block-styrene-block-2-(dimethylamino) ethyl methacrylate) (PEG-b-PS-b-PDMAEMA) triblock copolymer was synthesized by sequential ATRP method. Micelles with CdS nanoparticles in the corona were prepared by “in situ” reaction of hydrogen sulfide with cadmium ion clusters in the corona of the micelles. The size of the CdS nanoparticles is affected by molar ratio of DMAEMA to cadmium ions and polymer concentration in the solution. When introduced into o/w emulsion the micelles reassemble on the surface of styrene oil droplets. PS colloid particles stabilized by triblock copolymer with CdS nanoparticles were achieved by suspension polymerization. TEM image indicates that CdS nanoparticles locate at the surface of the PS colloid particles.
Keywords :
Micelle , CdS nanoparticles , Suspension polymerization
Journal title :
Polymer
Serial Year :
2008
Journal title :
Polymer
Record number :
1731678
Link To Document :
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