Title of article :
Plasma polymerized ferrocene films
Author/Authors :
Enlow، نويسنده , , Jesse O. and Jiang، نويسنده , , Hao and Grant، نويسنده , , John T. and Eyink، نويسنده , , Kurt and Su، نويسنده , , Weijie and Bunning، نويسنده , , Timothy J.، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2008
Pages :
4
From page :
4042
To page :
4045
Abstract :
This communication describes the formation of high index of refraction polymer thin films using a novel plasma polymerization deposition process. A flowing afterglow plasma reactor was modified to enable sublimation of solid samples into the gas phase for subsequent plasma polymerization. Thin films of plasma polymerized ferrocene were deposited on substrates and subsequently characterized. The refractive index as a function of processing conditions was obtained. Relatively high values of n (∼1.73 at 589 nm) were obtained. The chemical nature of the polymer thin films was characterized using FTIR and XPS spectroscopy. This work demonstrates that plasma polymerization is an enabling technology for the fabrication of photonic thin films that utilize solid state precursors.
Keywords :
Photonic thin film , Ferrocene , plasma polymerization
Journal title :
Polymer
Serial Year :
2008
Journal title :
Polymer
Record number :
1731999
Link To Document :
بازگشت