Effects of substrate roughness on the orientation of cylindrical domains in thin films of a polystyrene–poly(methylmethacrylate) diblock copolymer studied using atomic force microscopy and cyclic voltammetry

This paper describes the orientation of cylindrical domains in thin films of a polystyrene–poly(methylmethacrylate) diblock copolymer (PS-b-PMMA; 0.3 as the PMMA volume fraction) on gold and oxide-coated Si substrates having different surface roughness. Atomic force microscopy images of PS-b-PMMA films having thickness similar to the domain periodicity permitted us to study the effects of substrate roughness and block affinity on domain orientation. PS-b-PMMA films on gold substrates showed metastable vertical domain orientation that was attained more slowly on rougher substrates. In contrast, the domains were horizontally oriented on oxide-coated Si regardless of surface roughness and the annealing conditions examined. In addition, cyclic voltammetry data for PS-b-PMMA films on gold substrates whose PMMA domains were etched suggested that the metastable vertically oriented domains reached the underlying substrates. These results indicate that PS-b-PMMA films containing vertically oriented cylindrical domains can be obtained by using rough gold substrates upon annealing under controlled conditions.