Title of article :
Plasma polymerization of C4Cl6 and C2H2Cl4 at atmospheric pressure
Author/Authors :
Hubert، نويسنده , , J. and Poleunis، نويسنده , , C. and Delcorte، نويسنده , , A. and Laha، نويسنده , , P. and Bossert، نويسنده , , J. and Lambeets، نويسنده , , S. G. Ozkan، نويسنده , , A. and Bertrand، نويسنده , , P. and Terryn، نويسنده , , H. and Reniers، نويسنده , , F.، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2013
Pages :
8
From page :
4085
To page :
4092
Abstract :
In the present study, the feasibility of synthesizing chlorinated films by a dielectric barrier discharge at atmospheric pressure is assessed. Two different liquid monomers (hexachlorobuta-1,3-diene C4Cl6 and 1,1,1,2-tetrachloroethane C2H2Cl4) are tested and results show that organic coatings rich in chlorine can be deposited. The correlation and complementarity of water contact angle, X-ray photoelectron spectroscopy, secondary ion mass spectrometry and ellipsometry techniques have provided information to compare the properties of the perchlorinated layers built up from monomers with different Cl/C ratios and hydrogen concentrations. The bond dissociation energies of C–Cl2, C–Cl and C–C/CC/C–H are used to provide an explanation for the differences in films structure recorded by X-ray photoelectron spectroscopy and secondary ion mass spectrometry. Finally, dynamic-secondary ion mass spectrometry complemented by ellipsometry is used to calculate a deposition rate ranging from 40 to 70 nm/min depending on the plasma conditions. These measurements also show a good homogeneity of the film throughout its thickness.
Keywords :
Chlorine , XPS , plasma polymerization
Journal title :
Polymer
Serial Year :
2013
Journal title :
Polymer
Record number :
1740838
Link To Document :
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