Enhancement of structural and magnetic properties of Co/Cu(100) multilayers using Ti and Co seed layers

The influence of Ti and Co seed layers on the structural and magnetic properties of Co/Cu multilayers has been studied by X-ray diffraction (XRD), vibrating sample magnetometer (VSM) and four-lead magnetoresitance measurement. The samples were grown on MgO(100) single crystal substrates by sputter deposition at room temperature. The XRD results proved that by using Ti and Co seed layers, the crystal orientation of Cu buffers and Co/Cu multilayers were drastically changed to fcc (100) planes. Based on XRD results, it was concluded that the adhesion energy between seed layer and substrate was rather important than the lattice mismatch between them. The maximum giant magnetoresistance values of Co/Cu multilayers were enhanced by predeposition of Ti or Co seed layers, and it is suggested that Ti (earlier part of 3d transition metals (TM)) was more effective than Co (latter part of TM) as a seed layer.