Influence of the dopant concentration in In-doped SrTiO3 on the structural and transport properties

SrIn x Ti 1 − x O 3 thin films are grown epitaxially on NdGaO3 (001) and characterized for x = 0 , 0.005, 0.02, 0.1, 0.2, 0.5. While films with x = 0 , 0.2 and 0.5 are insulating, the ones with x=0.005, 0.02 and 0.1 are semiconducting and show a p-type behaviour. Highly rectifying diodes composed of SrIn0.005Ti0.995O3 grown on SrNb0.02Ti0.98O3 thin films confirm this behavior. Therefore the use of In as a dopant in SrTiO3 is promising in the field of semiconductors.