Title of article
TEM study of self-assembled FeSi2 nanostructures by ion beam implantation
Author/Authors
Gao، نويسنده , , Y. Z. Shao، نويسنده , , G. and Chen، نويسنده , , R.S. and Chong، نويسنده , , Y.T. and Li، نويسنده , , Quan، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
4
From page
97
To page
100
Abstract
In this letter, we show that self-assembled α - FeSi2 nanorods could be formed at the Si(100) surface by the ion beam implantation method. The microstructures and basic crystallographic relationships between the silicide nanocrystals and silicon substrate were investigated using transmission electron microscopy (TEM), and the experimental results revealed the growth mechanism of the nanorods. Our results indicated that the anisotropy in interfacial energy is the main cause for the nanorod formation.
Keywords
D. Ion beam implantation , A. FeSi2 , A. Nanostructures
Journal title
Solid State Communications
Serial Year
2009
Journal title
Solid State Communications
Record number
1764782
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