Title of article :
Fabrication and characterization of p-ZnO/n-Zn0.8Cd0.2O/n-ZnO heterojunction
Author/Authors :
Yuan، نويسنده , , G.D. and Ye، نويسنده , , Z.Z. and Huang، نويسنده , , J.Y. and Zhu، نويسنده , , L.P.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
3
From page :
290
To page :
292
Abstract :
We report the fabrication of p-ZnO/n- Zn0.8Cd0.2O/n-ZnO heterojunctions that contain Al–N codoped p-ZnO, undoped n- Zn0.8Cd0.2O, and Al-doped n-ZnO layers. An InZn alloy is used as the p- and n-ZnO Ohmic contact electrodes. This structure exhibits improved rectifying p–n junction behavior, with forward turn-on voltage in the range of 3–5 V. The reverse breakdown voltage can be as high as 15 V, with 10−6-A reverse leakage current. Photoluminescence spectra show strong near band-edge emissions for both p- and n-ZnO at 368 nm and for undoped n- Zn0.8Cd0.2O, which is substantially red-shifted to 399 nm.
Keywords :
A. Thin films , A. Semiconductors , B. Crystal growth , D. Electronic transport
Journal title :
Solid State Communications
Serial Year :
2009
Journal title :
Solid State Communications
Record number :
1764906
Link To Document :
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