Author/Authors :
Yoneyama، نويسنده , , Naoki and Sasaki، نويسنده , , Takahiko and Kobayashi، نويسنده , , Norio and Ikemoto، نويسنده , , Yuka and Moriwaki، نويسنده , , Taro and Kimura، نويسنده , , Hiroaki، نويسنده ,
Abstract :
We have fabricated a metallic structure in an organic Mott insulator κ-(BEDT-TTF)2Cu[N(CN)2]Cl. The periodic metallic domains of approximately 90×90 μm2 obtained by X-ray irradiation through a molybdenum mesh mask are visualized by scanning microregion infrared reflectance spectroscopy technique. No deterioration by irradiation is found in a range of nanometer to micrometer scales. We demonstrate that the present processing method is applicable for the fabrication of molecular electronic devices.
