Title of article
Site spectroscopy of Hf doping in Hf-doped crystals
Author/Authors
Hammoum، نويسنده , , R. and Fontana، نويسنده , , M.D. and Gilliot، نويسنده , , M. and Bourson، نويسنده , , P. and Kokanyan، نويسنده , , E.P.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
4
From page
1967
To page
1970
Abstract
By means of Raman scattering spectroscopy we determine the site location occupied by Hf ions in photorefractive damage resistant Hf-doped LiNbO3. At room temperature the two lowest frequency phonons are related to sites B (Nb) and A (Li), and are used to directly probe the dopant ion. For the low concentration range, the Hf ions go into the sites A whereas, for high concentration, Hf ions occupy both sites A and B. Results are compared with data obtained for pure congruent and stoichiometric crystals, and the proposed mechanism of incorporation of Hf ions in the LiNbO3 lattice explains the threshold in the behaviour of photorefractive properties.
Keywords
C. Point defects , A. Ferroelectrics , E. Inelastic light scattering
Journal title
Solid State Communications
Serial Year
2009
Journal title
Solid State Communications
Record number
1766087
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