• Title of article

    Self-assembled monolayers prepared from ω-thiophene-functionalized n-alkyltrichlorosilane on silicon substrates

  • Author/Authors

    Appelhans، نويسنده , , D and Ferse، نويسنده , , D and Adler، نويسنده , , H.-J.P and Plieth، نويسنده , , W and Fikus، نويسنده , , A and Grundke، نويسنده , , K and Schmitt، نويسنده , , F.-J and Bayer، نويسنده , , Barbara Adolphi، نويسنده , , B، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    10
  • From page
    203
  • To page
    212
  • Abstract
    Self-assembled monolayers (SAMs) of thienyl-functionalized n-alkyltrichlorosilane (11-(3-thienyl)undecyltrichlorosilane [TUTS]) have been prepared by adsorption from solution and characterized by using X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), contact angle measurements, ellipsometry, and scanning electron microscopy (SEM). Using contact angle and SEM measurements, the film preparation protocol was optimized, resulting in reproducible SAM formation with no adverse deposition of polysiloxane particles. XPS and ellipsometry studies confirmed the existence of SAM formation. AFM results show a smooth and homogeneous SAM, with surface roughness of Ra≤0.2 nm, which is slightly higher than the corresponding values for octadecyltrichlorosilane (OTS) SAMs. Such thiophene-based SAM surfaces can be used for surface-initiated polymerization of thiophene. The resulting formed polythiophene layers at non-compatible surfaces offer some practical applications in manufacturing [W. Plieth, A. Fikus, D. Appelhans, H.-J. Adler, German Patent Application No. 2661977 (1998); D. Appelhans, D. Ferse, H.-J. Adler, A. Fikus, W. Plieth, B. Aldolphi et al., J. Electrochem. Soc. (accepted)].
  • Keywords
    Silicon substrates , n-Alkyltrichlorosilanes , Thiophene-based surface , Adsorption , Self-assembled monolayers
  • Journal title
    Colloids and Surfaces A Physicochemical and Engineering Aspects
  • Serial Year
    2000
  • Journal title
    Colloids and Surfaces A Physicochemical and Engineering Aspects
  • Record number

    1767905