Title of article
Series expansion and computer simulation studies of random sequential adsorption
Author/Authors
Wang، نويسنده , , Jian-Sheng، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
19
From page
325
To page
343
Abstract
We discuss two important techniques; series expansion and Monte Carlo simulation, for a random sequential adsorption study. Random sequential adsorption is an idealization for surface deposition where the time scale of particle relaxation is much longer than the time scale of deposition. Particles are represented as extended objects which are adsorbed onto a continuum surface or lattice sites. Once landed on the surface, the particles stick to the surface. We review in some detail, various methods of computing the coverage θ(t) and present some of the recent and new results in random sequential adsorption.
Keywords
Random sequential adsorption , Lattice site , Particle relaxation , Deposition
Journal title
Colloids and Surfaces A Physicochemical and Engineering Aspects
Serial Year
2000
Journal title
Colloids and Surfaces A Physicochemical and Engineering Aspects
Record number
1768045
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