• Title of article

    Series expansion and computer simulation studies of random sequential adsorption

  • Author/Authors

    Wang، نويسنده , , Jian-Sheng، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    19
  • From page
    325
  • To page
    343
  • Abstract
    We discuss two important techniques; series expansion and Monte Carlo simulation, for a random sequential adsorption study. Random sequential adsorption is an idealization for surface deposition where the time scale of particle relaxation is much longer than the time scale of deposition. Particles are represented as extended objects which are adsorbed onto a continuum surface or lattice sites. Once landed on the surface, the particles stick to the surface. We review in some detail, various methods of computing the coverage θ(t) and present some of the recent and new results in random sequential adsorption.
  • Keywords
    Random sequential adsorption , Lattice site , Particle relaxation , Deposition
  • Journal title
    Colloids and Surfaces A Physicochemical and Engineering Aspects
  • Serial Year
    2000
  • Journal title
    Colloids and Surfaces A Physicochemical and Engineering Aspects
  • Record number

    1768045