Title of article
Surface engineering of biomedical metallic materials by plasma-based low-energy ion implantation
Author/Authors
Zhu، نويسنده , , X.M. and Lei، نويسنده , , M.K.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2005
Pages
4
From page
522
To page
525
Abstract
Plasma-based low-energy ion implantation, including plasma source ion nitriding/carburizing and plasma source low-energy ion enhanced deposition of thin films, for surface engineering of metallic materials was emerged as low-temperature, low-pressure surface modification technique. Plasma source ion nitriding onto AISI 316L austenitic stainless steel produced a high nitrogen face-centered-cubic phase (γN) layer about 10 μm thick at the temperature of 380 °C during 4 h with the high microhardness of HK0.1 N 22.0 GPa. The microhardness of the nitrided surface from the titanium nitride phase [(Ti, Al, V)N] layer on Ti6Al4V alloy at 750 °C during 4 h achieved up to about HK0.1 N 15.5 GPa. No pitting corrosion in the Ringer’s solution at 37 °C was detected by electrochemical polarization measurement for the nitrided AISI 316L stainless steel and Ti6Al4V alloy, respectively. Plasma source ion nitriding of the metallic materials provided the engineering surfaces with combined improvement in hardness and corrosion resistance.
Keywords
Ti6Al4V alloy , Plasma-based low-energy ion implantation , Austenitic stainless steel , Surface modification
Journal title
Current Applied Physics
Serial Year
2005
Journal title
Current Applied Physics
Record number
1769953
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