Title of article :
On the chaperon mechanism for association rate constants: the formation of HO2 and O3
Author/Authors :
Varandas، نويسنده , , A.J.C. and Pais، نويسنده , , A.A.C.C. and Marques، نويسنده , , J.M.C. and Wang، نويسنده , , W.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
8
From page :
264
To page :
271
Abstract :
We report rate constants for the formation of HO2 and O3 using the chaperon mechanism, and with Ar as scattering partner. The ArHO2 and ArO3 potential energy surfaces have been written as a pairwise summation of realistic EHFACE2-type potentials for interactions involving Ar and reliable global DMBE potential surfaces for chemically stable triatomic species. The calculations have been carried out using the quasiclassical trajectory approach.
Journal title :
Chemical Physics Letters
Serial Year :
1996
Journal title :
Chemical Physics Letters
Record number :
1775922
Link To Document :
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