• Title of article

    Photolysis of glyoxal at 193, 248, 308 and 351 nm

  • Author/Authors

    Zhu، نويسنده , , Lei and Kellis، نويسنده , , Daniel and Ding، نويسنده , , Chuan-Fan، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1996
  • Pages
    5
  • From page
    487
  • To page
    491
  • Abstract
    The UV photochemistry of glyoxal in nitrogen has been investigated by employing excimer laser photolysis at 193, 248, 308 and 351 nm in combination with cavity ring-down spectroscopy. The HCO radical was a photofragmentation product with yields of 0.42 ± 0.21, 0.53 ± 0.24, 0.69 ± 0.29, and 1.5 ± 0.6 at 193, 248, 308 and 351 nm. The larger than unity HCO yield at 351 nm suggests the photolysis channel (CHO)2 + hv (351 nm) → 2 HCO. The decrease in HCO yields at higher photolysis photon energies is attributed to the opening up of additional glyoxal photolysis pathways.
  • Journal title
    Chemical Physics Letters
  • Serial Year
    1996
  • Journal title
    Chemical Physics Letters
  • Record number

    1777526