Title of article :
Photolysis of glyoxal at 193, 248, 308 and 351 nm
Author/Authors :
Zhu، نويسنده , , Lei and Kellis، نويسنده , , Daniel and Ding، نويسنده , , Chuan-Fan، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
5
From page :
487
To page :
491
Abstract :
The UV photochemistry of glyoxal in nitrogen has been investigated by employing excimer laser photolysis at 193, 248, 308 and 351 nm in combination with cavity ring-down spectroscopy. The HCO radical was a photofragmentation product with yields of 0.42 ± 0.21, 0.53 ± 0.24, 0.69 ± 0.29, and 1.5 ± 0.6 at 193, 248, 308 and 351 nm. The larger than unity HCO yield at 351 nm suggests the photolysis channel (CHO)2 + hv (351 nm) → 2 HCO. The decrease in HCO yields at higher photolysis photon energies is attributed to the opening up of additional glyoxal photolysis pathways.
Journal title :
Chemical Physics Letters
Serial Year :
1996
Journal title :
Chemical Physics Letters
Record number :
1777526
Link To Document :
بازگشت