Title of article
Photolysis of glyoxal at 193, 248, 308 and 351 nm
Author/Authors
Zhu، نويسنده , , Lei and Kellis، نويسنده , , Daniel and Ding، نويسنده , , Chuan-Fan، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
5
From page
487
To page
491
Abstract
The UV photochemistry of glyoxal in nitrogen has been investigated by employing excimer laser photolysis at 193, 248, 308 and 351 nm in combination with cavity ring-down spectroscopy. The HCO radical was a photofragmentation product with yields of 0.42 ± 0.21, 0.53 ± 0.24, 0.69 ± 0.29, and 1.5 ± 0.6 at 193, 248, 308 and 351 nm. The larger than unity HCO yield at 351 nm suggests the photolysis channel (CHO)2 + hv (351 nm) → 2 HCO. The decrease in HCO yields at higher photolysis photon energies is attributed to the opening up of additional glyoxal photolysis pathways.
Journal title
Chemical Physics Letters
Serial Year
1996
Journal title
Chemical Physics Letters
Record number
1777526
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