Author/Authors :
Wang، نويسنده , , Yicheng and Christophorou، نويسنده , , Loucas G and Olthoff، نويسنده , , James K and Verbrugge، نويسنده , , Joel K، نويسنده ,
Abstract :
Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (∼13×10−14 cm3 s−1 for density-reduced electric fields, E/N<50×10−17 V cm2) has been measured, which may be due to impurities.
