Author/Authors :
Xiao، نويسنده , , Xing-cheng and Jiang، نويسنده , , Wei-hui and Song، نويسنده , , Li-xin and Tian، نويسنده , , Jing-fen and Hu، نويسنده , , Xing-fang، نويسنده ,
Abstract :
Amorphous carbon nitride films were first prepared by DC reactive magnetron sputtering, followed by heat treatment under protective nitrogen. The ensuing thermal effects were analyzed by DTA-TG, XRD and XPS. The results showed that heat treatment above 1100°C could induce the transition from an amorphous to a crystalline state of carbon nitride films. Apparent diffraction peaks of α-C3N4 appeared in the XRD spectra of samples heat-treated at 1180°C. XPS results further supported the analysis of crystallization of the films after heat treatment.
