Title of article :
Do Cu2+NH3 and Cu2+OH2 exist?: theory confirms `yes!ʹ
Author/Authors :
El-Nahas، نويسنده , , Ahmed M and Tajima، نويسنده , , Nobuo and Hirao، نويسنده , , Kimihiko، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Abstract :
CCSD(T) and MRMP calculations with TZP+ quality basis sets are used to study the interaction of Cu2+ with up to two ligand molecules L (L=H2O, H2S, NH3, and PH3). The dissociation to Cu+ and L+ is much more stable than the formation of Cu2+L adducts (by 76–100 kcal/mol). Nevertheless, it might be possible to obtain a one-ligand complex for H2O and NH3; barrier heights of 7 and 9 kcal/mol, respectively, are assigned for the dissociation process. Two ligands from H2O and NH3 can give more stable complexes with Cu2+ as the barrier heights reach 40 kcal/mol. In order to obtain stable complexes of PH3 or H2S with Cu2+, at least two ligands are required.
Journal title :
Chemical Physics Letters
Journal title :
Chemical Physics Letters