Title of article :
An intense pulsed electrical discharge source for OH molecular beams
Author/Authors :
van Beek، نويسنده , , M.C. and ter Meulen، نويسنده , , J.J.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
6
From page :
237
To page :
242
Abstract :
In this Letter we describe and characterize a pulsed DC discharge source for a molecular beam of OH radicals. The absolute line-integrated OH density has been measured by cavity ring-down spectroscopy, while the off-axis distribution of the radicals has been determined by 1-dimensional laser-induced fluorescence spectroscopy. Combining both measurements the total OH centerline flux at the maximum of the pulse was determined to be (2.2±0.1)×1017 molecules/sr s. No anomalous population distribution was found for the Λ-doublet components of the rotational ground state.
Journal title :
Chemical Physics Letters
Serial Year :
2001
Journal title :
Chemical Physics Letters
Record number :
1782782
Link To Document :
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