Author/Authors :
Nishida، نويسنده , , Satoshi and Takahashi، نويسنده , , Kenshi and Matsumi، نويسنده , , Yutaka and Chiappero، نويسنده , , Malisa and Argüello، نويسنده , , Gustavo and Wallington، نويسنده , , Timothy J. and Hurley، نويسنده , , Michael J. and Ball، نويسنده , , James C، نويسنده ,
Abstract :
FTIR smog chamber techniques have been used to show that reaction of CF3O2 radicals with NO proceeds via two channels giving either CF3O + NO2 (5a) or CF3ONO2 (5b) as products. In 700 Torr of N2/O2 diluent at 296 K the branching ratio for CF3 ONO2 formation is k5b/(k5a+k5b)=(1.67±0.27)×10−2. The CF3ONO2 forming channel is in the fall off regime at pressures of 50 Torr and below, while for pressures above 100 Torr the reaction approaches the high-pressure limit. This behavior is consistent with the predictions of recent master equation calculations [Chem. Rev. 103 (2003) 4577].
