Title of article
Field-effect doping phenomenon in an organic semiconductor layer deposited by the Langmuir–Blodgett technique
Author/Authors
Ikegami، نويسنده , , Keiichi and Ohnuki، نويسنده , , Hitoshi and Izumi، نويسنده , , Mitsuru، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2006
Pages
5
From page
808
To page
812
Abstract
The gate-voltage-dependence of the drain current–voltage characteristics have been measured for organic field-effect transistors (OFETs) based on thick and thin Langmuir–Blodgett (LB) films of octadecyl tetracyano quino dimethane. The obtained results have indicated that the field-effect doping phenomena in OFETs with thick and thin LB films are basically the same with each other. A theoretical approach based on a simple four-layer model has also be taken to obtain basic understanding of the field-effect doping phenomenon in OFETs. Through this approach, it has been suggested that when the organic semiconductor layer is extremely thin, the total amount of the doped charge, Q, deviates from the prediction of the well-known threshold relationship, Q ∝ (VG − Vth), where VG and Vth are the gate voltage and its threshold value, respectively, but the charges are still localized in the interface region like in the case of OFETs with thick semiconductor layers.
Keywords
Organic n-type semiconductor , Langmuir–Blodgett films , Organic FET , Model , Carrier doping
Journal title
Current Applied Physics
Serial Year
2006
Journal title
Current Applied Physics
Record number
1785335
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