Title of article :
Polymer tips for application of atomic force microscopy
Author/Authors :
Kim، نويسنده , , Woo-Sik and Park، نويسنده , , Kang-Min and Park، نويسنده , , Jung Jin and Chang، نويسنده , , Sang Mok and Kim، نويسنده , , In-Ho and Muramatsu، نويسنده , , Hiroshi and Kim، نويسنده , , Jong Min، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2007
Pages :
4
From page :
528
To page :
531
Abstract :
A hydrophobic polymer tip for atomic force microscopy has been fabricated by two-photon adsorbed photopolymerization techniques and has been applied for the high resolution imaging of a hydrophilic metal surface. Using optimized photopolymerization conditions, we have succeeded in fabricating sub-100-nm sized polymer tips. This fabricating resolution of two-photon adsorbed photopolymerization is also confirmed by other supporting experiments. The imaging results show that the capillary-force-induced image distortion can be successfully removed by applying a pure hydrophobic polymer tip with a lateral resolution better than 5 nm, which is difficult to achieve with a commercial tip without any environmental control.
Keywords :
Polymer tip , Hydrophobicity , AFM , SPM , Two-photon adsorption
Journal title :
Current Applied Physics
Serial Year :
2007
Journal title :
Current Applied Physics
Record number :
1785956
Link To Document :
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