Author/Authors :
Fuchs، نويسنده , , A. R. Bender، نويسنده , , M. and Plachetka، نويسنده , , U. and Kock، نويسنده , , L. C. Koo، نويسنده , , N. and Wahlbrink، نويسنده , , T. and Kurz، نويسنده , , H.، نويسنده ,
Abstract :
In the past decade nanoimprint has been developed to a serious alternative for next generation lithography (NGL). In this work, the most recent developments of UV-nanoimprint Lithography (UV-NIL) with special emphasis to the work accomplished at AMO and the IHT-RWTH Aachen are reviewed and functional applications demonstrated. Further the potentials of various UV-NIL concepts are evaluated and possible interests in certain application areas are discussed.
Keywords :
Lithography , Nanoimprint , UV-NIL , Nanopatterning , NANOTECHNOLOGY
