Title of article :
Analysis of resin flow during nano-imprinting lithographic process
Author/Authors :
Kang، نويسنده , , J.H. and Kim، نويسنده , , S.M. and Woo، نويسنده , , Y.S. and LEE، نويسنده , , W.I.، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2008
Pages :
8
From page :
679
To page :
686
Abstract :
Viscous flow of the resin in nano-imprinting lithography has been investigated. Flow behavior of the thermoplastic polymer was analyzed experimentally as well as numerically. Effects of process variables such as the temperature and the pressure and the stamp geometry on the filling pattern were studied. In order to observe the effect of stamp geometry, three different types of geometries were considered. Experiments were performed using polymethylmethacrylate (PMMA) sheets. Filled patterns were observed using a scanning electron microscopy (SEM). Fixed grid method along with the finite element method was used for numerical analysis. Numerical results exhibited a similar tendency as the experimental observation.
Keywords :
Nanoscale pattern formation , nanolithography , multiphase flows
Journal title :
Current Applied Physics
Serial Year :
2008
Journal title :
Current Applied Physics
Record number :
1786203
Link To Document :
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