• Title of article

    Analysis of resin flow during nano-imprinting lithographic process

  • Author/Authors

    Kang، نويسنده , , J.H. and Kim، نويسنده , , S.M. and Woo، نويسنده , , Y.S. and LEE، نويسنده , , W.I.، نويسنده ,

  • Issue Information
    دوماهنامه با شماره پیاپی سال 2008
  • Pages
    8
  • From page
    679
  • To page
    686
  • Abstract
    Viscous flow of the resin in nano-imprinting lithography has been investigated. Flow behavior of the thermoplastic polymer was analyzed experimentally as well as numerically. Effects of process variables such as the temperature and the pressure and the stamp geometry on the filling pattern were studied. In order to observe the effect of stamp geometry, three different types of geometries were considered. Experiments were performed using polymethylmethacrylate (PMMA) sheets. Filled patterns were observed using a scanning electron microscopy (SEM). Fixed grid method along with the finite element method was used for numerical analysis. Numerical results exhibited a similar tendency as the experimental observation.
  • Keywords
    Nanoscale pattern formation , nanolithography , multiphase flows
  • Journal title
    Current Applied Physics
  • Serial Year
    2008
  • Journal title
    Current Applied Physics
  • Record number

    1786203