Title of article :
Effect of thickness on the microstructure and soft magnetic properties of CoFeHfO thin films
Author/Authors :
Tho، نويسنده , , Luu Van and Lee، نويسنده , , Kwang-Eun and Kim، نويسنده , , Cheol Gi and Kim، نويسنده , , Chong Oh، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2008
Abstract :
The thickness effects on the microstructure and soft magnetic properties of CoFeHfO thin films have been investigated in the range of 100–600 nm. There was a significant change in the coercivity (Hc) and the anisotropy (Hk) value with increasing film thickness, but the saturation induction and the resistivity almost remain unchanged. Hc and Hk reached a minimum value of 0.19 Oe and a maximum value of 50 Oe, respectively at 200 nm film thickness. The high saturation magnetic induction is 21 kG and resistivity is 500 μΩ cm. The origin of the changing Hc and Hk values is discussed in detail based on change of microstructure along with film thickness.
Keywords :
75.70.?I , Thickness , Magnetic properties , microstructure , CoFeHfO thin films
Journal title :
Current Applied Physics
Journal title :
Current Applied Physics