• Title of article

    Ab initio calculations on the compensation mechanisms in InP

  • Author/Authors

    Schmidt، نويسنده , , T.M and Miwa، نويسنده , , R.H. and Fazzio، نويسنده , , A and Mota، نويسنده , , R، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    3
  • From page
    353
  • To page
    355
  • Abstract
    Compensation mechanisms which become semi-insulating InP from intrinsic n-type materials are investigated by first principles total energy calculations. Associated to the possible mechanisms two intrinsic defects are shown to play an important role in the transition, induced by annealing, from the n-type to the semi-insulating character. The single defect VIn3− results from the In-vacancy–H-complex, which, before the annealing, was identified by infra-red spectra as responsible for the n-type conductivity, and the PIn+VP complex defect comes from the diffusion of the neutral In vacancy. Both defects are shown to present localized levels inside the band gap which compensate for the free electron.
  • Keywords
    A. Semiconductors , D. Electronic states (localized) , C. Point defects
  • Journal title
    Solid State Communications
  • Serial Year
    2001
  • Journal title
    Solid State Communications
  • Record number

    1786451