Title of article :
A novel one-step electrochemical method to obtain crystalline titanium dioxide films at low temperature
Author/Authors :
Karuppuchamy، نويسنده , , S. and Suzuki، نويسنده , , N. and Ito، نويسنده , , Shyam S. and Endo، نويسنده , , T.، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2009
Pages :
6
From page :
243
To page :
248
Abstract :
A crystalline titanium dioxide (TiO2) thin film on various metal substrates such as hot-dip-galvanized (HDG), electrochemically galvanized (EG) and cold rolled steel (CRS) has been successfully prepared for the first time by simple one-step electrodeposition method from alkaline aqueous solution containing potassium titanium oxalate and hydroxylamine. The as-grown titanium dioxide films are composed of a mixture of anatase, rutile and brookite structures and have a good crystalline state. The present investigation reveals that the electrochemical deposition of crystalline titanium dioxide on different metal substrates from single electrochemical bath is possible and very promising as a preparation method for industrial applications.
Keywords :
Titanium dioxide , Crystal growth , Thin films , Semiconductors , Electrodeposition
Journal title :
Current Applied Physics
Serial Year :
2009
Journal title :
Current Applied Physics
Record number :
1786478
Link To Document :
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