Author/Authors :
Kwon، نويسنده , , Deuk Chul and Yoon، نويسنده , , N.S. and Han، نويسنده , , J.H. and Shon، نويسنده , , J.W.، نويسنده ,
Abstract :
We numerically study the effect of the gas injection position in an inductively coupled plasma (ICP) discharge. To study the effect, we present an injection model when a nozzle is placed inside of the chamber. The results show that the dependency of the neutral density is sensitive, while the difference of the charged particle density is negligible. The electron temperature difference at the injection positions increases slightly when the pressure decreases.