Title of article :
A numerical study of the effect of gas injection position in an inductively coupled plasma discharge
Author/Authors :
Kwon، نويسنده , , Deuk Chul and Yoon، نويسنده , , N.S. and Han، نويسنده , , J.H. and Shon، نويسنده , , J.W.، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2009
Pages :
5
From page :
546
To page :
550
Abstract :
We numerically study the effect of the gas injection position in an inductively coupled plasma (ICP) discharge. To study the effect, we present an injection model when a nozzle is placed inside of the chamber. The results show that the dependency of the neutral density is sensitive, while the difference of the charged particle density is negligible. The electron temperature difference at the injection positions increases slightly when the pressure decreases.
Keywords :
Simulation , ICP , Fluid
Journal title :
Current Applied Physics
Serial Year :
2009
Journal title :
Current Applied Physics
Record number :
1786697
Link To Document :
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