Title of article :
Contact resistance dependent scaling-down behavior of amorphous InGaZnO thin-film transistors
Author/Authors :
Cho، نويسنده , , Edward Namkyu and Kang، نويسنده , , Jung Han and Yun، نويسنده , , Ilgu، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2011
Pages :
5
From page :
1015
To page :
1019
Abstract :
Here, we report scaling effects on the electrical properties of amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs). The a-IGZO TFTs had same channel width/length ratio (W/L = 20), but different channel lengths (L = 20, 10, 5, and 2.5 μm). To examine the scaling-down behaviors, short-channel effects and contact resistance of the TFTs were investigated. As the channel length decreased, apparent shift of threshold voltage (Vth) and degradation of subthreshold swing (SSUB) were shown. In addition, it is also found that the field-effect mobility (μFE) was degraded as the channel length was decreased which was originated from contact resistance. Due to this contact resistance effect, drain current (IDS) was decreased for short-channel devices.
Keywords :
short-channel effects , contact resistance , InGaZnO , Thin-film transistors
Journal title :
Current Applied Physics
Serial Year :
2011
Journal title :
Current Applied Physics
Record number :
1788250
Link To Document :
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