Title of article :
Arresting photodegradation of porous silicon by a polymer coating
Author/Authors :
Mandal، نويسنده , , N.P. and Sharma، نويسنده , , Ashutosh and Agarwal، نويسنده , , S.C.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
4
From page :
183
To page :
186
Abstract :
Light soaking in air rapidly decreases photoluminescence (PL) of porous silicon (PS) and increases electron spin resonance (ESR) signal. In vacuum, a short light exposure (<2700 s) increases PL and decreases ESR, but longer exposures again degrade the PL. We could arrest the light-induced degradation over long periods by applying a thin polymer coating, which resulted in constant PL and ESR intensities. The PL intensity of coated PS is comparable to the PL intensity of a fresh PS sample in air. FTIR spectrum suggests new bond formations at the PS/polymer interface that may be responsible for PL stability.
Keywords :
A. Nanostructures , A. Semiconductors , E. Luminescence
Journal title :
Solid State Communications
Serial Year :
2004
Journal title :
Solid State Communications
Record number :
1788545
Link To Document :
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