Author/Authors :
Xu، نويسنده , , Jun and Li، نويسنده , , Xin-Ya Mei، نويسنده , , Jiaxin and Huang، نويسنده , , Xiaohui and Li، نويسنده , , Zhifeng and Li، نويسنده , , Wei and Chen، نويسنده , , Kunji، نويسنده ,
Abstract :
The microstructures and field emission characteristics of hydrogenated amorphous carbon films prepared by using different hydrogen dilution ratio were investigated. It was found that a very low threshold electric field emission could be achieved for samples with moderated hydrogen dilution ratio. However, the field emission characteristics became worse for samples with high hydrogen dilution ratio. The change of field emission can be attributed to the change of electronic structures due to the hydrogen dilution in addition to the increase of the hydrogen surface termination.
